Technique for Suspect/Counterfeit EEE Parts Detection by Secondary Ion Mass Spectrometry (SIMS) Test Methods AS6171/13

This document defines the capabilities and limitations of SIMS as they pertain to Suspect/Counterfeit EEE part detection. Additionally, this document outlines requirements associated with the application of SIMS including: operator training, sample preparation, data interpretation, equipment maintenance, and reporting of data. The Test Laboratory shall be accredited to ISO/IEC 17025 to perform the SIMS Test Method as defined in this standard. The Test Laboratory shall indicate in the ISO/IEC 17025 scope statement the specific method being accredited to: Option 1: All AS6171/13 Test Methods, or Option 2: All AS6171/13 Test Methods except 2D Imaging and 3D Imaging, or Option 3: All AS6171/13 Test Methods except Depth Profiling and 3D Imaging. If SAE AS6171/13 is invoked in the contract, the base document, AS6171 General Requirements, shall also apply. This document contains tests that can be specified by the Requester in generating the test requirements as part of the Statement of Work (SOW) or Purchase Order (PO) and can be used for Counterfeit Defect Coverage (CDC) calculations per AS6171/1 (see 1.1). 1.1 Test Method Selection for the Purpose of Counterfeit Defect Coverage (CDC) The following is a list of applicable SIMS Test Methods described in this document that are listed in 3.4 of AS6171 General Requirements: SIMS – Mass Spectral Analysis SIMS – 2D Imaging (incremental to SIMS – Mass Spectral Analysis) SIMS – Depth Profiling (incremental to SIMS – Mass Spectral Analysis) SIMS – 3D Imaging (independent) Since 2D Imaging and Depth Profiling are labeled as “incremental to SIMS – Mass Spectral Analysis”, if 2D Imaging and/or Depth Profiling are specified in the SOW and/or PO, the specified Test Method(s) shall be included in the Test Set in addition to SIMS - Mass Spectral Analysis. Since 3D Imaging is labeled as “independent”, if 3D Imaging is specified in the SOW and/or PO, then SIMS – 3D Imaging is the only SIMS Test Method required. 1.2 Potential Applications for Detection of Suspect/Counterfeit EEE Parts The following provides a summary of the potential applications of each SIMS test method for detection of Suspect/Counterfeit EEE Parts. Each of these tests can be applied to either Active Parts or Passive Parts.   SIMS – Mass Spectral Analysis (see 6.1) a. Determination of elemental composition in one or more specific locations at the surface of a sample b. Determination of chemical composition (molecular fragments) in one or more specific locations at the surface of a sample c. Determination of molecular composition in one or more specific locations at the surface of a sample SIMS – 2D Imaging (see 6.2) a. 2D spatial distribution of information about a sample such as elemental composition, chemical composition, and/or molecular composition at the surface of a sample b. Visualization of materials distribution over an area, such as of trace elements and/or contamination c. Analysis of nominally homogeneous structures SIMS – Depth Profiling (see 6.3) a. Distribution of elemental composition as a function of depth into a sample b. Distribution of chemical composition as a function of depth into a sample c. Distribution of molecular composition as a function of depth into a sample d. Determination of film thickness e. Determination of the thickness of shallow implantation layers f. Detection of surface segregation SIMS – 3D imaging (see 6.4) a. 3D reconstruction of information about a sample, such as elemental composition, chemical composition, and/or molecular composition b. 3D visualization of materials distribution, such as of trace elements and/or contamination c. Determination of the thickness of thin films d. Detection of preferential surface segregation e. Determination of the thickness of shallow implantation layers