Qualitative Analysis of Induction Process of Anisotropic Structures in Titanium Thin Films 2013-36-0580

The obtaining of thin films of titanium, through physical deposition techniques, it is shown as a recurring research topic in the scientific community. The intrinsic mechanisms associated with quantum processes of these materials are justifications for their specific applications. The structural analysis of thin films it reveals of significant importance due to the fact of the presence of discontinuities, for example, that influence the electrical impedance presented by the coating. The present work refers to the comparative study of procedures, and the design of devices, which induce the formation of random discontinuities in thin films of titanium with nanometers thickness. Such discontinuities are generated by different techniques, in order to promote changes in surface properties, for example, the value of electrical resistivity of these coatings.